on 07 May 2019
Last Applicant/ Owned by
129 Concord Road, Building #2
Billerica
MA
01821
Serial Number
87275081 filed on 20th Dec 2016
Registration Number
5746002 registered on 07th May 2019
Correspondent Address
Cynthia Johnson Walden Fish & Richardson P.C.
Filing Basis
1. intent to use
2. use application currently
Disclaimer
NO DATA
Adsorbed gas for use in the manufacture of semi-conductors and microelectronic products, as provided in a gas supply container holding adsorbent material; absorbing carbons for general industrial use; chemical compositions for use in removing microelectronics manufacturing fabrication materials from microelectronic products such as wafers and microelectronic devices that are recycled following theRead More
Adsorbed gas for use in the manufacture of semi-conductors and microelectronic products, as provided in a gas supply container holding adsorbent material; absorbing carbons for general industrial use; chemical compositions for use in removing microelectronics manufacturing fabrication materials from microelectronic products such as wafers and microelectronic devices that are recycled following the removal of such materials; chemical gases sold with gas supply equipment for storing gases and dispensing such gases on demand, namely, chemical gases sold in a metal vessel holding the gas in a pressurized or liquid form, with a pressure regulator within said vessel and a flow control valve for on-demand dispensing of such gas for use in semiconductor manufacturing; chemical products, namely, chemical compositions for use in vapor deposition processes; chemical compositions, namely, reagents for use in the manufacture of semiconductors in the electronics and semiconductor manufacturing industry; chemical compositions, namely, reagents, namely, epitaxial thin film materials, organometallic source reagent compounds and complexes, and ion implantation materials, all for use in the electronics and semiconductor manufacturing industry; chemical source material in the nature of chemical compositions for depositing films on substrates in the manufacture of semiconductors, flat panel displays, and solar panels; chemical source material in the nature of chemical compositions for the deposition of thin films on semiconductor wafers for the manufacture of semiconductors; chemicals for treating hazardous gases in semiconductor applications; chemicals for use in chemical reagent delivery systems for use in the manufacture of semiconductors; chemicals for use in manufacture of semiconductors, integrated circuits, flat-panel displays, solar panels, and photovoltaic products; chemicals for vapor deposition metallization; composite materials, namely, composites comprised of polymers and carbon nanotubes for use in the further manufacture of molded articles; gas provided in a gas supply container holding adsorbent material for use in the manufacture of semiconductors and for use in other industrial processes; gases for use in the manufacture semiconductors, microelectronics, solar panels, and flat panel displays, as provided in gas supply vessels and for on-demand dispensing of such gas for use in such manufacturing; processing gases for use in the manufacture of semiconductors, flat panel displays, compact discs and recording media; chemical compositions, namely, semiconductor manufacturing chemical reagents; sub-atmospheric pressure gas sources, namely, gases adsorbed on adsorbents in gas supply containers for use in the manufacture of semiconductors, microelectronics, solar panels and flat panel displays; sub-atmospheric pressure gas storage and dispensing systems for gases for manufacturing semiconductors, solar panels, and flat panel displays, comprised of adsorbents with gases for manufacturing semiconductors, solar panels, and flat panel displays adsorbed thereon, not including natural gas or natural gas dehydration or purification machines; sub-atmospheric pressure gas, namely, gases for manufacturing semiconductors, solar panels, and flat panel displays, not including natural gas; sub-atmospheric pressure gases for ion implantation and chemical vapor deposition
31st Dec 2016
31st Dec 2016
Polymeric and non-polymeric coating services that provide additional chemical, electrical, and/or protective characteristics to a part or substrate, namely, applying carbon based polymeric coatings and ceramic, inorganic, and metallic non-polymeric coatings for use as purifiers or filters, for use in high temperature applications in aerospace and defense industries, for use to create highly polished surfaces in the aerospace industry, for use in minimizing contaminants or providing desired electrical conductivity in the semiconductor, flat panel and microelectronics industries; polymeric and non-polymeric coating services that provide additional chemical, electrical, and/or protective characteristics to a part or substrate, namely, membranes and metals for use as purifiers or filters, for use in high temperature applications in aerospace and defense industries, for use to create highly polished surfaces in the aerospace industry, for use in minimizing contaminants or providing desired electrical conductivity in the semiconductor, flat panel and microelectronics industries; custom manufacturing of wafers and coatings sold as a component of electrical/electronic substrates, for use in manufacturing
31st Dec 2008
31st Dec 2008
No 87275081
No Service Mark
No TBD
No
No
No
No
No
No
No
No
26.01.13 -
Two circles
26.01.16 -
Circles touching or intersecting
26.01.21 -
Circles that are totally or partially shaded
The mark consists of two intersecting circles.
| Status Date | Action Taken |
|---|---|
| 07th May 2024 | COURTESY REMINDER - SEC. 8 (6-YR) E-MAILED |
| 13th Nov 2019 | ASSIGNMENT OF OWNERSHIP NOT UPDATED AUTOMATICALLY |
| 07th May 2019 | REGISTERED-PRINCIPAL REGISTER |
| 02th Apr 2019 | NOTICE OF ACCEPTANCE OF STATEMENT OF USE E-MAILED |
| 01st Apr 2019 | ALLOWED PRINCIPAL REGISTER - SOU ACCEPTED |
| 12th Mar 2019 | STATEMENT OF USE PROCESSING COMPLETE |
| 08th Mar 2019 | USE AMENDMENT FILED |
| 08th Mar 2019 | TEAS STATEMENT OF USE RECEIVED |
| 27th Sep 2018 | NOTICE OF APPROVAL OF EXTENSION REQUEST E-MAILED |
| 27th Sep 2018 | CORRECTED NOA E-MAILED |
