on 20 Feb 2024
Last Applicant/ Owned by
Serial Number
79360593 filed on 26th Oct 2022
Registration Number
N/A
Filing Basis
1. filing basis filed as 66 a
Disclaimer
NO DATA
LASER TEC; LASER TECH Defect repairing machines for photomasks for semiconductors; defect repairing machines for reticles for semiconductors; defect repairing machines for wafers for semiconductors; defect repairing machines for photomasks for flat panel displays; defect repairing machines for photomask blanks for flat panel displays Semiconductor photomask optical inspection apparatus; analyzinRead More
Semiconductor photomask optical inspection apparatus; analyzing apparatus, namely, optical inspection apparatus for defect of photomasks for semiconductors; semiconductor photomask pattern optical inspection apparatus; semiconductor photomask pattern measuring apparatus, namely, optical measurement system comprised of optical inspection apparatus for detection, measurement and cleaning of foreign matter and defects on semiconductor photomask pattern; semiconductor photomask imaging apparatus, namely, optical imaging apparatus for inspection of semiconductor photomask; semiconductor photomask phase-shift measuring apparatus, namely, optical measurement system comprised of optical inspection apparatus for measurement of semiconductor photomask phase-shift; semiconductor photomask transmittance measuring apparatus, namely, optical measurement system comprised of optical inspection apparatus for measurement of semiconductor photomask transmittance; apparatus and instruments for measuring semiconductor photomask phase shifting amount, namely, optical measurement system comprised of optical inspection apparatus for measurement of semiconductor photomask phase shifting amount; semiconductor reticle optical inspection apparatus; analyzing apparatus, namely, optical inspection apparatus for defect of semiconductor reticles; semiconductor reticle pattern optical inspection apparatus; semiconductor reticle pattern measuring apparatus, namely, optical measurement system comprised of optical inspection apparatus for detection, measurement and cleaning of foreign matter and defects on semiconductor reticle pattern; semiconductor reticle imaging apparatus, namely, optical imaging apparatus for inspection of semiconductor reticle; semiconductor wafer optical inspection apparatus; semiconductor wafer measuring apparatus, namely, optical measurement system comprised of optical inspection apparatus for detection, measurement and cleaning of foreign matter and defects on semiconductor wafer; semiconductor wafer imaging apparatus, namely, optical imaging apparatus for inspection of semiconductor wafer; semiconductor wafer edge optical inspection apparatus; analyzing apparatus, namely, optical inspection apparatus for defect of wafers for semiconductors; semiconductor photomask blanks optical inspection apparatus; semiconductor photomask blanks imaging apparatus, namely, optical imaging apparatus for inspection of semiconductor photomask blanks; optical inspection apparatus for defect of flat panel display photomasks; optical inspection apparatus for defect of flat panel display photomask pattern; flat panel display photomask pattern measuring apparatus, namely, optical measurement system comprised of optical inspection apparatus for detection, measurement and cleaning of foreign matter and defects on flat panel display photomask pattern; optical inspection apparatus for defect of flat panel display photomask blanks; pellicle optical inspection apparatus for photomasks for flat panel displays; pellicle mounting apparatus, namely, optical inspection apparatus with the capability of mounting pellicles on photomasks for flat panel displays; confocal microscopes; laser microscopes; computer peripheral devices; optical inspection systems for in-suit visualizing of electro-chemical reactions comprising optical inspection apparatus for semi-conductor materials and elements; semi-conductor testing machines and instruments; electron microscopes; semiconductor defect detectors; testing apparatus not for medical purposes, namely, semiconductor testing apparatus; precision crystallographic measuring apparatus; data sets, downloadable, in the field of semiconductors; computer software, recorded, for operating semiconductor photomask, reticle or pellicle optical inspection apparatus; computer software applications, downloadable, for operating semiconductor photomask, reticle or pellicle optical inspection apparatus; computer hardware; computer programs, downloadable, for operating semiconductor photomask, reticle or pellicle optical inspection apparatus
Defect repairing machines for photomasks for semiconductors; defect repairing machines for reticles for semiconductors; defect repairing machines for wafers for semiconductors; defect repairing machines for photomasks for flat panel displays; defect repairing machines for photomask blanks for flat panel displays
No 79360593
No Service/Collective Mark
No TM230108USIP
No
No
No
No
Yes
Yes
No
No
The mark consists of the stylized wording "LASERTEC".
| Status Date | Action Taken |
|---|---|
| 04th Mar 2024 | OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED |
| 26th Feb 2024 | NOTIFICATION PROCESSED BY IB |
| 20th Feb 2024 | PUBLISHED FOR OPPOSITION |
| 07th Feb 2024 | NOTICE OF START OF OPPOSITION PERIOD CREATED, TO BE SENT TO IB |
| 07th Feb 2024 | NOTIFICATION OF POSSIBLE OPPOSITION SENT TO IB |
| 03rd Feb 2024 | NEW REPRESENTATIVE AT IB RECEIVED |
| 31st Jan 2024 | NOTIFICATION OF NOTICE OF PUBLICATION E-MAILED |
| 31st Jan 2024 | OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED |
| 17th Jan 2024 | APPROVED FOR PUB - PRINCIPAL REGISTER |
| 02th Jan 2024 | EXAMINERS AMENDMENT -WRITTEN |
