on 08 Mar 2022
Last Applicant/ Owned by
1209 ORANGE STREET
WILMINGTON
DE
19801
Serial Number
88698404 filed on 19th Nov 2019
Registration Number
6667318 registered on 08th Mar 2022
Correspondent Address
Cynthia Johnson Walden
Filing Basis
1. intent to use
2. use application currently
Disclaimer
"MATERIALS"
"MATERIALS" Chemical slurry for polishing semiconductors; Chemical slurries for polishing semiconductors, silicon wafers, glass, metals, plastics, machinery, electronic components and substrates, optical components, computer parts, magnetic data-storage disks and heads for use in the semiconductor, electronic, rigid disk and magnetic head industries; Chemical slurries for polishing semiconductorsRead More
Non-abrasive polishing pads for chemical-mechanical planarizing or chemical mechanical polishing (cmp) machines for use in the manufacture of semiconductor wafers, integrated circuits, hard disk drives and chipsets; Polishing pads for polishing machines for use in the manufacture of semiconductor wafers, integrated circuits, hard disk drives and chipsets; Polishing pads for use in the manufacture of advanced integrated circuit devices within the semiconductor industry
19th May 2021
19th May 2021
Industrial lubricants, namely, valve lubricants for the oil and gas storage, pipeline and gas distribution markets; Industrial lubricants and greases
19th Mar 2021
19th Mar 2021
Industrial abrasives, namely, abrasive compounds for lapping and polishing semiconductors, silicon wafers, glass and metal surfaces; Chemical cleaner directed to the electronics industry; Post-copper chemical mechanical planarization (cmp) cleaning solution for use in the manufacturing and processing of semiconductors; Chemical cleaning solution for processing of integrated circuit (ic) in the opto-electronics and photonics industries; Post-ash cleaning solution for use in the manufacturing and processing of semiconductors; Abrasive preparations, namely, chemical cleaners, namely, abrasive dispersion slurries and cleaning and polishing preparations for use in the finishing of electronic components and substrates, optical components, glass, metals, plastics, machinery, computer parts, magnetic data-storage disks and heads
17th Jan 2021
17th Jan 2021
Chemical slurry for polishing semiconductors; Chemical slurries for polishing semiconductors, silicon wafers, glass, metals, plastics, machinery, electronic components and substrates, optical components, computer parts, magnetic data-storage disks and heads for use in the semiconductor, electronic, rigid disk and magnetic head industries; Chemical slurries for polishing semiconductors used for the treatment of semiconductors to planarize, smooth, or otherwise modify their chemical-mechanical properties; Chemical slurries for polishing semiconductors used for the treatment of semiconductors to planarize, smooth or otherwise modify their mechanical, physical, chemical and electrical properties; Chemical solutions for use in the manufacturing and processing of semiconductors, namely, photoresist stripper, benzotriazole (BTA) and L-proline solution; Fumed silica dispensed in water used to polish semiconductors; Aqueous metal oxide dispersions for use in semiconductor polishing; Chemical additives, namely, abrasive dispersions for use in the manufacture of electronic components and substrates, optical components, metals, machinery, computer parts, and magnetic data-storage disks and heads; Chemical slurries for use in the manufacture of advanced integrated circuit devices within the semi-conductor industry; High purity chemical compositions for electronic component manufacture; Chemical compositions for use in semiconductor manufacturing, solar cell panel manufacturing and flat panel display manufacturing; Chemical compositions for removal of photoresist and post-etch residues in the manufacture of semiconductors, integrated circuits and related products; Chemicals for use in industry and science; Chemical preparations for use in industry and science, namely, for use in the semiconductor and micro-electronics industries; Chemicals, namely, polymer-containing drag reducers and flow improvers to increase flow of hydrocarbons through pipelines; Chemical mechanical polishing (cmp) slurry and chemical mechanical planarization (cmp) slurry for use in the manufacturing and processing of semiconductors in the optoelectronics and photonics industries
24th May 2021
24th May 2021
No 88698404
No Service/Collective Mark
No 461010762001
No
No
No
No
No
No
No
No
| Status Date | Action Taken |
|---|---|
| 18th Oct 2023 | AUTOMATIC UPDATE OF ASSIGNMENT OF OWNERSHIP |
| 09th Aug 2023 | TEAS CHANGE OF OWNER ADDRESS RECEIVED |
| 09th Aug 2023 | APPLICANT/CORRESPONDENCE CHANGES (NON-RESPONSIVE) ENTERED |
| 09th Aug 2023 | TEAS REVOKE/APP/CHANGE ADDR OF ATTY/DOM REP RECEIVED |
| 09th Aug 2023 | ATTORNEY/DOM.REP.REVOKED AND/OR APPOINTED |
| 09th Aug 2023 | TEAS CHANGE OF CORRESPONDENCE RECEIVED |
| 08th Mar 2022 | REGISTERED-PRINCIPAL REGISTER |
| 02th Feb 2022 | NOTICE OF ACCEPTANCE OF STATEMENT OF USE E-MAILED |
| 01st Feb 2022 | NOTICE OF APPROVAL OF EXTENSION REQUEST E-MAILED |
| 01st Feb 2022 | ALLOWED PRINCIPAL REGISTER - SOU ACCEPTED |
