ASYNTIS Canadian Trademark Information

On Tuesday, May 6, 2003, a canadian trademark registration was filed for ASYNTIS by ASYNTIS GMBH *********, **********, ***** ****. The Canadian IP office has given the trademark application number of 1177162. The current status of this trademark filing is Interruption of proceeding. The ASYNTIS trademark is filed in the description of Machines and machine tools for plasma treatment of silicon articles, namely, semiconductor wafer processing machines, semiconductor manufacturing machines, semiconductor substrate manufacturing machines, semiconductor substrate etching machines; machines for treatment of silicon discs; grinding machines for grinding semiconductors, in particular for back grinding wafers, in particular silicon wafers; machines for transport and storage of silicon discs; plasma etching machines; gas plasma processing machines, gas plasma generators. , Apparatus and instruments for conducting, switching, transforming, accumulating, regulating and/or controlling electric current for operating plasma treatment equipment, namely, electrical conductors, electrical switches, electrical transformers, electric accumulators, voltage regulators for electric power; data processors, computer hardware and software for controlling plasma treatment machines; parts, controls and fittings for plasma treatment machines. , Scientific and technological research, development and design services, namely research and consulting in the field of plasma treatment of articles; industry analysis and research services, namely, providing technical, engineering, scientific and computer consultation services in the fields of semiconductors and plasma technology; engineering, planning, leading and surveillance of projects, namely, conducting technical research, design and product development in the field of plasma technology; planning and designing equipment and system controls for treatment and manufacture of silicon articles; and adaptation and development of operating parameters for the field of plasma treatment equipment and maintenance of plasma treatment equipment. , Machines and machine tools for plasma treatment of silicon articles, namely, semiconductor wafer processing machines, semiconductor manufacturing machines, semiconductor substrate manufacturing machines, semiconductor substrate etching machines; machines for treatment of silicon discs; grinding machines for grinding semiconductors, in particular for back grinding wafers, in particular silicon wafers; machines for transport and storage of silicon discs; plasma etching machines; gas plasma processing machines, gas plasma generators. , Scientific and technological research, development and design services, namely research and consulting in the field of plasma treatment of articles; industry analysis and research services, namely, providing technical, engineering, scientific and computer consultation services in the fields of semiconductors and plasma technology; engineering, planning, leading and surveillance of projects, namely, conducting technical research, design and product development in the field of plasma technology; planning and designing equipment and system controls for treatment and manufacture of silicon articles; and adaptation and development of operating parameters for the field of plasma treatment equipment and maintenance of plasma treatment equipment. , Apparatus and instruments for conducting, switching, transforming, accumulating, regulating and/or controlling electric current for operating plasma treatment equipment, namely, electrical conductors, electrical switches, electrical transformers, electric accumulators, voltage regulators for electric power; data processors, computer hardware and software for controlling plasma treatment machines; parts, controls and fittings for plasma treatment machines. .