on 26 Mar 2024
Last Applicant/ Owned by
677 River Oaks Parkway
San Jose
CA
95134
Serial Number
97911161 filed on 27th Apr 2023
Registration Number
N/A
Correspondent Address
Kyu Min
Filing Basis
1. intent to use
2. intent to use current
Disclaimer
NO DATA
Scientific, technological, and industrial research and development services for semiconductor processing or deposition of thin films on substrates; Scientific and technological services, namely, research and design in the field of material transformation of the surface of industrial products relating to chemical vapor deposition (CVD), plasma-enhanced chemical vapor deposition (PECVD), atomic layeRead More
Scientific, technological, and industrial research and development services for semiconductor processing or deposition of thin films on substrates; Scientific and technological services, namely, research and design in the field of material transformation of the surface of industrial products relating to chemical vapor deposition (CVD), plasma-enhanced chemical vapor deposition (PECVD), atomic layer deposition (ALD) or atomic vapor deposition (AVD) of thin films, in particular in relation to the operation of machines and installations for CVD, PECVD, ALD and AVD of thin films onto surfaces; Industrial research in the field of material transformation of the surface of industrial products relating chemical vapor deposition (CVD), plasma-enhanced chemical vapor deposition (PECVD), atomic layer deposition (ALD) or atomic vapor deposition (AVD) of thin films, in particular in relation to the operation of machines and installations for chemical vapor deposition (CVD), plasma-enhanced chemical vapor deposition (PECVD), atomic layer deposition (ALD) or atomic vapor deposition (AVD) of thin films onto surfaces; Design and development of computer hardware and software, in particular for operating machines and installations for chemical vapor deposition (CVD), plasma-enhanced chemical vapor deposition (PECVD), atomic layer deposition (ALD) or atomic vapor deposition (AVD) of thin films onto surfaces; Technical consulting in the field of new product design and development, namely, in the field of chemical vapor deposition (CVD), plasma enhanced chemical vapor deposition (PECVD), atomic layer deposition (ALD) or atomic vapor deposition (AVD) of thin films, in particular in relation to the design of machines and installations for chemical vapor deposition (CVD), plasma enhanced chemical vapor deposition (PECVD), atomic layer deposition (ALD) or atomic vapor deposition (AVD) of thin films
Processing of semiconductors or deposition of thin films on substrates; Consulting services pertaining to the material transformation of the surface of industrial products relating to chemical and/or plasma-enhanced vapor deposition, in particular in relation to the operation of machines and installations for chemical vapor deposition (CVD), plasma enhanced chemical vapor deposition (PECVD), atomic layer deposition (ALD) or atomic vapor deposition (AVD) of thin films onto surfaces
Industrial apparatus using air to assist in the drying and cleaning of components in the semiconductor industry
Recorded computers software for semiconductor processing or for thin film deposition; Semiconductor testing apparatus; Computer software for use in processing semiconductor wafers; Electronic semiconductor control, checking and measuring devices, namely, computer hardware and recorded computer software for use in measuring, checking and controlling thin film growth or deposition on wafer surfaces and wafer surface temperatures of individual semiconductor wafers; Semiconductors; Downloadable computer control software for use in operating semiconductor manufacturing machines and installations for chemical vapor deposition (CVD) reactors, plasma-enhanced chemical vapor deposition (PECVD) reactors, atomic layer deposition (ALD) reactors or atomic vapor deposition (AVD) reactors for deposition of thin films onto surfaces; Downloadable computer operating system software for use in operating semiconductor manufacturing machines and installations for chemical and/or plasma enhanced vapor deposition of polymers onto surfaces; Electronic controllers and measuring devices used with semiconductor manufacturing machines and installations for chemical and/or plasma enhanced vapor deposition of polymers onto surfaces
Machines for semiconductor processing / manufacturing; Machines for thin film deposition; Semiconductor chip manufacturing equipment, namely, semiconductor chip manufacturing machines; Semiconductor wafer processing equipment; Semiconductor manufacturing machines, namely, chemical vapor deposition (CVD) reactors, plasma-enhanced chemical vapor deposition (PECVD) reactors, atomic layer deposition (ALD) reactors or atomic vapor deposition (AVD) reactors and component parts of CVD, PECVD, ALD or AVD reactors, namely, injection apparatus and instruments for liquid or gaseous substances for the manufacture of semiconductors; Machines for the production of semiconductors; Robots, vacuum systems, motors and engines, drive units, and parts of machines for operating semiconductor manufacturing machines; Injection machines for use in manufacturing semiconductors for injection of liquid or gaseous material and not for medical purposes; Metal organic vapor deposition equipment, namely, vapor deposition apparatus for semiconductor processing machines, and chemical vapor deposition apparatus for use in manufacturing semiconductors
No 97911161
No Service Mark
No EUGEN.004T
No
No
No
No
No
No
No
No
Status Date | Action Taken |
---|---|
26th Mar 2024 | WITHDRAWN FROM PUB - OG REVIEW QUERY |
11th Mar 2024 | APPROVED FOR PUB - PRINCIPAL REGISTER |
08th Mar 2024 | TEAS RESPONSE TO OFFICE ACTION RECEIVED |
08th Mar 2024 | CORRESPONDENCE RECEIVED IN LAW OFFICE |
08th Mar 2024 | TEAS/EMAIL CORRESPONDENCE ENTERED |
19th Jan 2024 | NON-FINAL ACTION WRITTEN |
19th Jan 2024 | NON-FINAL ACTION E-MAILED |
19th Jan 2024 | NOTIFICATION OF NON-FINAL ACTION E-MAILED |
30th Nov 2023 | ASSIGNED TO EXAMINER |
25th May 2023 | NEW APPLICATION OFFICE SUPPLIED DATA ENTERED |